Schäfer, L., Klages, C., Meier, U., & Kohse-Höinghaus, K. (1991). Atomic hydrogen concentration profiles at filaments used for chemical vapor deposition of diamond. American Institute of Physics (AIP).
Chicago Style (17th ed.) CitationSchäfer, L., C.-P Klages, U. Meier, and K. Kohse-Höinghaus. Atomic Hydrogen Concentration Profiles at Filaments Used for Chemical Vapor Deposition of Diamond. Woodbury, NY: American Institute of Physics (AIP), 1991.
MLA (9th ed.) CitationSchäfer, L., et al. Atomic Hydrogen Concentration Profiles at Filaments Used for Chemical Vapor Deposition of Diamond. American Institute of Physics (AIP), 1991.
Warning: These citations may not always be 100% accurate.