Singh, B., Thomas III, J. H., & Patel, V. (1992). Magnetic multipole-based reactive ion etching reactor. American Institute of Physics (AIP).
Chicago Style (17th ed.) CitationSingh, B., J. H. Thomas III, and V. Patel. Magnetic Multipole-based Reactive Ion Etching Reactor. Woodbury, NY: American Institute of Physics (AIP), 1992.
MLA (9th ed.) CitationSingh, B., et al. Magnetic Multipole-based Reactive Ion Etching Reactor. American Institute of Physics (AIP), 1992.
Warning: These citations may not always be 100% accurate.