Reactive ion etching of gallium nitride in silicon tetrachloride plasmasa) - Adesida, I.; Mahajan, A.; Andideh, E.; Khan, M. Asif; Olsen, D. T.; Kuznia, J. N. (American Institute of Physics (AIP), 1993)
http://dx.doi.org/10.1063/1.110331
Keywords: U