Nayak, D. K., Usami, N., Fukatsu, S., & Shiraki, Y. (1994). Photoluminescence of Si/SiGe/Si quantum wells on separation by oxygen implantation substrate. American Institute of Physics (AIP).
Chicago Style (17th ed.) CitationNayak, D. K., N. Usami, S. Fukatsu, and Y. Shiraki. Photoluminescence of Si/SiGe/Si Quantum Wells on Separation by Oxygen Implantation Substrate. Woodbury, NY: American Institute of Physics (AIP), 1994.
MLA (9th ed.) CitationNayak, D. K., et al. Photoluminescence of Si/SiGe/Si Quantum Wells on Separation by Oxygen Implantation Substrate. American Institute of Physics (AIP), 1994.
Warning: These citations may not always be 100% accurate.