APA (7th ed.) Citation

Vázquez, L., Albella, J. M., Salvarezza, R. C., Arvia, A. J., Levy, R. A., & Perese, D. (1996). Roughening kinetics of chemical vapor deposited copper films on Si(100). American Institute of Physics (AIP).

Chicago Style (17th ed.) Citation

Vázquez, L., J. M. Albella, R. C. Salvarezza, A. J. Arvia, R. A. Levy, and D. Perese. Roughening Kinetics of Chemical Vapor Deposited Copper Films on Si(100). Woodbury, NY: American Institute of Physics (AIP), 1996.

MLA (9th ed.) Citation

Vázquez, L., et al. Roughening Kinetics of Chemical Vapor Deposited Copper Films on Si(100). American Institute of Physics (AIP), 1996.