Performance of Co/Al2O3/NiFe magnetic tunnel junctions prepared by a two-step rf plasma oxidation method - Yoon, K. S.; Park, J. H.; Choi, J. H.; Yang, J. Y.; Lee, C. H.; Kim, C. O.; Hong, J. P. (American Institute of Physics (AIP), 2001)
http://dx.doi.org/10.1063/1.1391407
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