Li, Y. L., Hu, S. Y., Liu, Z. K., & Chen, L. Q. (2002). Effect of electrical boundary conditions on ferroelectric domain structures in thin films. American Institute of Physics (AIP).
Chicago Style (17th ed.) CitationLi, Y. L., S. Y. Hu, Z. K. Liu, and L. Q. Chen. Effect of Electrical Boundary Conditions on Ferroelectric Domain Structures in Thin Films. Woodbury, NY: American Institute of Physics (AIP), 2002.
MLA (9th ed.) CitationLi, Y. L., et al. Effect of Electrical Boundary Conditions on Ferroelectric Domain Structures in Thin Films. American Institute of Physics (AIP), 2002.
Warning: These citations may not always be 100% accurate.