Gas microstrip chambers - Barasch, E.F.; Bowcook, T.J.V.; Demroff, H.P.; Elliott, S.M.; Howe, M.R.; Lee, B.; Mazumdar, T.K.; McIntyre, P.M.; Smith, D.D.; Vanstaaelen, G.; Wahl, J.; Gaedke, R.M.; et al. (Elsevier)
The gas microstrip chamber has been developed from concept to experimental system during the past three years. A pattern of anode and grid lines are microfabricated onto a dielectric substrate and configured as a high-resolution MWPC. Four recent developments are described: suitable plastic substrates and lithography techniques for large-area chambers; non-planar silicon-based chambers for 20 μm resolution; integrated on-board synchronous front-end electronics and data buffering; and a porous silicon active cathode for enhanced efficiency and time response. The microstrip chamber appears to be a promising technology for applications in microvertex, tracking spectrometer, muon spectrometer, and transition radiation detection.
http://linkinghub.elsevier.com/retrieve/pii/0168-9002(92)90699-5
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