Eberhardt, P., & Hofmann, A. Diffusion behaviour of low-energy helium ions implanted in aluminum. Elsevier.
Chicago Style (17th ed.) CitationEberhardt, P., and A. Hofmann. Diffusion Behaviour of Low-energy Helium Ions Implanted in Aluminum. Amsterdam: Elsevier.
MLA (9th ed.) CitationEberhardt, P., and A. Hofmann. Diffusion Behaviour of Low-energy Helium Ions Implanted in Aluminum. Elsevier.
Warning: These citations may not always be 100% accurate.