Kinetic and equilibrium study of Br atom reactions with trimethylsilane using the very low pressure reactor technique - Choe, M.; Yul Choo, K. (Elsevier)
The very low pressure reactor technique was used for measurement of the forward (k"1) and reverse (k"-"1) rate constants for the Br atom reaction with trimethylsilane: Br + (CH"3)"3SiH HBr + (CH"3)"3S1. From the kinetic data and entropy estimation the bond dissociation energy for SiH in trimethylsilane is 90.1 = 1.1 kcal/mole. The Arrhenius parameters for k"1 and k"-"1 were obtained.
http://linkinghub.elsevier.com/retrieve/pii/0009-2614(82)83385-X
Keywords: V; U