APA (7th ed.) Citation

Chung, C. K., Lu, H. C., & Jaw, T. H. (2000). High aspect ratio silicon trench fabrication by inductively coupled plasma. Springer.

Chicago Style (17th ed.) Citation

Chung, C. K., H. C. Lu, and T. H. Jaw. High Aspect Ratio Silicon Trench Fabrication by Inductively Coupled Plasma. Springer, 2000.

MLA (9th ed.) Citation

Chung, C. K., et al. High Aspect Ratio Silicon Trench Fabrication by Inductively Coupled Plasma. Springer, 2000.