Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser

Lan, Y. F. ; Peters, P. J. M. ; Witteman, W. J.
Springer
Published 1991
ISSN:
1432-0649
Keywords:
34.80 D ; 41.80 Dd ; 42.55 F
Source:
Springer Online Journal Archives 1860-2000
Topics:
Physics
Notes:
Abstract In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
Type of Medium:
Electronic Resource
URL:
_version_ 1798295438769520640
autor Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
autorsonst Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
book_url http://dx.doi.org/10.1007/BF00325492
datenlieferant nat_lic_papers
hauptsatz hsatz_simple
identnr NLM203287029
issn 1432-0649
journal_name Applied physics
materialart 1
notes Abstract In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
package_name Springer
publikationsjahr_anzeige 1991
publikationsjahr_facette 1991
publikationsjahr_intervall 8009:1990-1994
publikationsjahr_sort 1991
publisher Springer
reference 52 (1991), S. 336-340
schlagwort 34.80 D
41.80 Dd
42.55 F
search_space articles
shingle_author_1 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
shingle_author_2 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
shingle_author_3 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
shingle_author_4 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
shingle_catch_all_1 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
34.80 D
41.80 Dd
42.55 F
34.80 D
41.80 Dd
42.55 F
Abstract In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
1432-0649
14320649
Springer
shingle_catch_all_2 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
34.80 D
41.80 Dd
42.55 F
34.80 D
41.80 Dd
42.55 F
Abstract In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
1432-0649
14320649
Springer
shingle_catch_all_3 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
34.80 D
41.80 Dd
42.55 F
34.80 D
41.80 Dd
42.55 F
Abstract In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
1432-0649
14320649
Springer
shingle_catch_all_4 Lan, Y. F.
Peters, P. J. M.
Witteman, W. J.
Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
34.80 D
41.80 Dd
42.55 F
34.80 D
41.80 Dd
42.55 F
Abstract In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities.
1432-0649
14320649
Springer
shingle_title_1 Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
shingle_title_2 Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
shingle_title_3 Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
shingle_title_4 Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
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timestamp 2024-05-06T09:36:13.098Z
titel Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
titel_suche Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
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