Electrical strength of oxide films on metals
| ISSN: |
1573-9228
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|---|---|
| Source: |
Springer Online Journal Archives 1860-2000
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| Topics: |
Physics
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| Notes: |
Abstract Electrical breakdown under dc stress is examined for anodic oxide films on tantalum and zirconium of 100–5000 Å thickness. It is found that the strength is greater for the thinner films, which points to an ionization breakdown mechanism. It is considered that allowance must be made for electron traps and formation of a negative space charge in discussing the breakdown of amorphous oxide films.
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| Type of Medium: |
Electronic Resource
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| URL: |