Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen
| ISSN: |
0360-6376
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|---|---|
| Keywords: |
Physics ; Polymer and Materials Science
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| Source: |
Wiley InterScience Backfile Collection 1832-2000
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| Topics: |
Chemistry and Pharmacology
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| Notes: |
The thermogravimetry (TGA) in nitrogen was measured for poly(tetramethyl-p-silphenylene)-siloxane (TMPS) fractions with narrow molecular weight distributions and for block copolymers of TMPS and dimethyl siloxane (DMS) with varying composition. The measurements were made with the Perkin-Elmer DCS IB-TGA attachment which consists of a Cahn electrobalance and a wire-wound furnace with programmable temperature controls. The weight loss curves for heating rates of 10, 20, and 40°C/min were analyzed using the method of Flynn and Wall. The analysis indicates that thermal degradation proceeds primarily by scission of the siloxane bond with an activation energy of 44 ± 3 kcal/mole for the uncatalyzed reaction and 13 ± 2 kcal/mole for the reaction occurring in the presence of residual catalyst. The thermal stability of the TMPS-DMS copolymer is impaired through increasing the concentration of the DMS component. Cyclic DMS trimer and TMPS monomer and dimer were observed by mass spectrometry which gave results consistent with the proposed mechanism of degradation.
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| Additional Material: |
6 Ill.
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| Type of Medium: |
Electronic Resource
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| URL: |
| _version_ | 1798298187687002112 |
|---|---|
| addmaterial | 6 Ill. |
| autor | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. |
| autorsonst | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. |
| book_url | http://dx.doi.org/10.1002/pol.1975.170130920 |
| datenlieferant | nat_lic_papers |
| hauptsatz | hsatz_simple |
| identnr | NLM163386676 |
| iqvoc_descriptor_keyword | iqvoc_00000092:Materials |
| issn | 0360-6376 |
| journal_name | Journal of Polymer Science: Polymer Chemistry Edition |
| materialart | 1 |
| notes | The thermogravimetry (TGA) in nitrogen was measured for poly(tetramethyl-p-silphenylene)-siloxane (TMPS) fractions with narrow molecular weight distributions and for block copolymers of TMPS and dimethyl siloxane (DMS) with varying composition. The measurements were made with the Perkin-Elmer DCS IB-TGA attachment which consists of a Cahn electrobalance and a wire-wound furnace with programmable temperature controls. The weight loss curves for heating rates of 10, 20, and 40°C/min were analyzed using the method of Flynn and Wall. The analysis indicates that thermal degradation proceeds primarily by scission of the siloxane bond with an activation energy of 44 ± 3 kcal/mole for the uncatalyzed reaction and 13 ± 2 kcal/mole for the reaction occurring in the presence of residual catalyst. The thermal stability of the TMPS-DMS copolymer is impaired through increasing the concentration of the DMS component. Cyclic DMS trimer and TMPS monomer and dimer were observed by mass spectrometry which gave results consistent with the proposed mechanism of degradation. |
| package_name | Wiley-Blackwell |
| publikationsjahr_anzeige | 1975 |
| publikationsjahr_facette | 1975 |
| publikationsjahr_intervall | 8024:1975-1979 |
| publikationsjahr_sort | 1975 |
| publikationsort | New York |
| publisher | Wiley-Blackwell |
| reference | 13 (1975), S. 2181-2188 |
| schlagwort | Physics Polymer and Materials Science |
| search_space | articles |
| shingle_author_1 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. |
| shingle_author_2 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. |
| shingle_author_3 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. |
| shingle_author_4 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. |
| shingle_catch_all_1 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen Physics Polymer and Materials Science Physics Polymer and Materials Science The thermogravimetry (TGA) in nitrogen was measured for poly(tetramethyl-p-silphenylene)-siloxane (TMPS) fractions with narrow molecular weight distributions and for block copolymers of TMPS and dimethyl siloxane (DMS) with varying composition. The measurements were made with the Perkin-Elmer DCS IB-TGA attachment which consists of a Cahn electrobalance and a wire-wound furnace with programmable temperature controls. The weight loss curves for heating rates of 10, 20, and 40°C/min were analyzed using the method of Flynn and Wall. The analysis indicates that thermal degradation proceeds primarily by scission of the siloxane bond with an activation energy of 44 ± 3 kcal/mole for the uncatalyzed reaction and 13 ± 2 kcal/mole for the reaction occurring in the presence of residual catalyst. The thermal stability of the TMPS-DMS copolymer is impaired through increasing the concentration of the DMS component. Cyclic DMS trimer and TMPS monomer and dimer were observed by mass spectrometry which gave results consistent with the proposed mechanism of degradation. 0360-6376 03606376 Wiley-Blackwell |
| shingle_catch_all_2 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen Physics Polymer and Materials Science Physics Polymer and Materials Science The thermogravimetry (TGA) in nitrogen was measured for poly(tetramethyl-p-silphenylene)-siloxane (TMPS) fractions with narrow molecular weight distributions and for block copolymers of TMPS and dimethyl siloxane (DMS) with varying composition. The measurements were made with the Perkin-Elmer DCS IB-TGA attachment which consists of a Cahn electrobalance and a wire-wound furnace with programmable temperature controls. The weight loss curves for heating rates of 10, 20, and 40°C/min were analyzed using the method of Flynn and Wall. The analysis indicates that thermal degradation proceeds primarily by scission of the siloxane bond with an activation energy of 44 ± 3 kcal/mole for the uncatalyzed reaction and 13 ± 2 kcal/mole for the reaction occurring in the presence of residual catalyst. The thermal stability of the TMPS-DMS copolymer is impaired through increasing the concentration of the DMS component. Cyclic DMS trimer and TMPS monomer and dimer were observed by mass spectrometry which gave results consistent with the proposed mechanism of degradation. 0360-6376 03606376 Wiley-Blackwell |
| shingle_catch_all_3 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen Physics Polymer and Materials Science Physics Polymer and Materials Science The thermogravimetry (TGA) in nitrogen was measured for poly(tetramethyl-p-silphenylene)-siloxane (TMPS) fractions with narrow molecular weight distributions and for block copolymers of TMPS and dimethyl siloxane (DMS) with varying composition. The measurements were made with the Perkin-Elmer DCS IB-TGA attachment which consists of a Cahn electrobalance and a wire-wound furnace with programmable temperature controls. The weight loss curves for heating rates of 10, 20, and 40°C/min were analyzed using the method of Flynn and Wall. The analysis indicates that thermal degradation proceeds primarily by scission of the siloxane bond with an activation energy of 44 ± 3 kcal/mole for the uncatalyzed reaction and 13 ± 2 kcal/mole for the reaction occurring in the presence of residual catalyst. The thermal stability of the TMPS-DMS copolymer is impaired through increasing the concentration of the DMS component. Cyclic DMS trimer and TMPS monomer and dimer were observed by mass spectrometry which gave results consistent with the proposed mechanism of degradation. 0360-6376 03606376 Wiley-Blackwell |
| shingle_catch_all_4 | Funt, J. M. Parekh, R. D. Magill, J. H. Shah, Y. T. Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen Physics Polymer and Materials Science Physics Polymer and Materials Science The thermogravimetry (TGA) in nitrogen was measured for poly(tetramethyl-p-silphenylene)-siloxane (TMPS) fractions with narrow molecular weight distributions and for block copolymers of TMPS and dimethyl siloxane (DMS) with varying composition. The measurements were made with the Perkin-Elmer DCS IB-TGA attachment which consists of a Cahn electrobalance and a wire-wound furnace with programmable temperature controls. The weight loss curves for heating rates of 10, 20, and 40°C/min were analyzed using the method of Flynn and Wall. The analysis indicates that thermal degradation proceeds primarily by scission of the siloxane bond with an activation energy of 44 ± 3 kcal/mole for the uncatalyzed reaction and 13 ± 2 kcal/mole for the reaction occurring in the presence of residual catalyst. The thermal stability of the TMPS-DMS copolymer is impaired through increasing the concentration of the DMS component. Cyclic DMS trimer and TMPS monomer and dimer were observed by mass spectrometry which gave results consistent with the proposed mechanism of degradation. 0360-6376 03606376 Wiley-Blackwell |
| shingle_title_1 | Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen |
| shingle_title_2 | Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen |
| shingle_title_3 | Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen |
| shingle_title_4 | Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen |
| sigel_instance_filter | dkfz geomar wilbert ipn albert |
| source_archive | Wiley InterScience Backfile Collection 1832-2000 |
| timestamp | 2024-05-06T10:19:54.735Z |
| titel | Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen |
| titel_suche | Thermal degradation of poly(tetramethyl-p-silphenylene) siloxane homopolymers and copolymers in nitrogen |
| topic | V |
| uid | nat_lic_papers_NLM163386676 |